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Physics of Thin Films: Advances in Research and Development

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by Maurice H. Francombe
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Physics of Thin Films: Advances in Research and Development by Maurice H. Francombe

Physics of Thin Films: Advances in Research and Development primarily deals with the influence of ions or optical energy on the deposition, properties, and etching on thin films.
The book is a collection of five articles, with one article per chapter. Chapter 1 covers ionized cluster beam deposition; epitaxy; and film-formation mechanism. Chapter 2 discusses the activated reactive evaporation process; the deposition of refractory compounds; the role of plasma in the process; and its applications. Chapter 3 focuses on ion-beam processing of optical thin films; ion sources and ion-surface interactions; and the different kinds of bombardment involved. Chapter 4 deals with laser induced etching - its mechanisms, methods, and applications. Chapter 5 talks about contacts to GaAs devices; Fermi-level pinning; and heterojunction contacts.
The book is recommended for physicists and engineers in the field of electronics who would like to know more about thin films and the progresses in the field.

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Ebook Details
Pages: 262
Size: 26.6 MB
Publisher: Academic Press
Date published:   1987
ISBN: 9781483103303 (DRM-PDF)

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This product is listed in the following category:

Nonfiction > Science > Physics

This author has products in the following categories:

Nonfiction > Science > Chemistry > Organic
Nonfiction > Technology > Optics
Nonfiction > Technology > Electronics > Microelectronics
Nonfiction > Technology > Material Science
Nonfiction > Science > Physics
Nonfiction > Science > Chemistry > Physical & Theoretical
Nonfiction > Science > Energy
Nonfiction > Science > Mechanics

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