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Thin Films by Chemical Vapour Deposition

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by C. E. Morosanu
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Thin Films by Chemical Vapour Deposition by C. E. Morosanu

The explosive growth in the semiconductor industry has caused a rapid evolution of thin film materials that lend themselves to the fabrication of state-of-the-art semiconductor devices. Early in the 1960s an old research technique named chemical vapour phase deposition (CVD), which has several unique advantages, developed into the most widely used technique for thin film preparation in electronics technology.

In the last 25 years, tremendous advances have been made in the science and technology of thin films prepared by means of CVD. This book presents in a single volume, an up-to-date overview of the important field of CVD processes which has never been completely reviewed previously.

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Ebook Details
Size: 92.8 MB
Publisher: Elsevier Science
Date published:   1990
ISBN: 9781483291734 (DRM-PDF)

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This product is listed in the following categories:

Nonfiction > Science > Physics
Nonfiction > Technology > Engineering > Chemical & Biochemical
Nonfiction > Technology > Material Science

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